REINING IN Magnetic structures keep coronal loops in check, as shown here
in extreme ultraviolet light observed by NASA's Solar Dynamics Observatory just before a coronal mass ejection.
Japan's Hinode spacecraft picked up low - energy X-rays, depicted in green, while NASA's Solar Dynamics Observatory imaged areas
with extreme ultraviolet light, shown in yellow and red.
We're now talking about
using extreme ultraviolet light [as a lithography beam], which would give us a 13 - nanometer - wide light source, smaller than what we're using now by more than a factor of 10.
Exposing a small cluster of neon atoms to a very short and intense burst of
extreme ultraviolet light initiates a novel mechanism that produces a large number of electrons and ions.
While extreme ultraviolet light is a promising technology, he adds, «you also need the resist materials that can pattern to the resolution that extreme ultraviolet can promise.»
A close - up, profile view of an active region in
extreme ultraviolet light showcased several small spurts of plasma as they flickered out and retreated back into the sun over about 13 hours (June 16, 2011).
The laser gives a kick of energy to the neon atoms, which then release this energy in the form of brief pulses
of extreme ultraviolet light.
Recorded
in extreme ultraviolet light, it covers a 230,000 - by - 77,000 kilometer area on the sun's surface and shows a one - million - degree solar plasma cooling down.
«We control the below - threshold harmonic light emission by using electromagnetic fields with time - dependent ellipticity, like we have done to the above - threshold high - order harmonics,» said Chang referring to the creation of a 67 - attosecond pulse of
extreme ultraviolet light, which earned him international recognition.
When we generate
this extreme ultraviolet light, next we have to get it all the way to the sample in a short pulse and then we must have the pump beam perfectly aligned on the sample.
In late 2003 Krausz's group demonstrated another kind of imaging using 250 - attosecond (2.5 x 1016 second) pulses of
extreme ultraviolet light, the shortest light pulses ever produced.
These tools, however, produce nothing close to the angstrom - level (tenth of a nanometer) resolution of a new type of microscope that uses femtosecond pulses of
extreme ultraviolet light (EUV)-- the same wavelength light to be used for sub-10 nanometer semiconductor lithography.]
A close - up of one active region on the sun, seen in profile in
extreme ultraviolet light, produced an interesting display of dynamic and frenetic sputtering over three days (Aug. 28 - 30, 2011).
The lone active region visible on the sun put on a fine display with its tangled magnetic field lines swaying and twisting above it (Apr.24 - 26, 2018) when viewed in a wavelength of
extreme ultraviolet light.