The team of researchers from MIPT's Laboratory of Functional Materials and Devices for Nanoelectronics, with the participation of their colleagues from the University of Nebraska (USA) and the University of Lausanne (Switzerland), have for the first time experimentally demonstrated that polycrystalline alloyed films of
hafnium and zirconium oxides with a
thickness of just 2.5 nm (see image below) retain their ferroelectric properties.