2004 - 2006: Join project «High -
k dielectric film deposition characterization» in the framework of a NSF / CNRS join program.
Tags for this Online Resume: High
K dielectrics, Semiconductor Devices, VLSI Design, Digital Circuit Design, Analog Circuit Design, IC Design
Not exact matches
The present invention relates to an enhanced sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low
dielectric constant (low -
k) films, high
dielectric constant (high -
k) films, and other conductive, semi-conductive, and non-cond...