Not exact matches
Researchers
used a combined atomic / molecular layer
deposition (ALD / MLD)
technique, to prepare lithium terephthalate, a recently found anode material for a lithium - ion battery.
Using a
technique common in the semiconductor industry called atomic layer
deposition (ALD), they coated pieces of silver with layers of aluminum oxide only 1 atom thick.
The researchers pulled off the feat by tuning the growth conditions of their films
using a
technique called metal organic chemical vapor
deposition (MOCVD).
They
used scalable dip - coating procedures to build up polymer multilayers and ensured thin metal electrode coatings with physical vapor
deposition techniques.
Jonathan Petrie led the epitaxial synthesis of strained oxide materials and catalytic testing, and Tricia Meyer assisted thin film
deposition using a
technique that employs a high - power excimer laser to vaporize material and deposit it as high - quality thin films under precisely controlled conditions.
Atomic layer
deposition is a layer - by - layer chemical vapor
deposition - based thin - film growth
technique used extensively in the electronics industry to deposit nanometer - thick films of dielectric materials on devices.
Abstract: Scientists at the U.S. Naval Research Laboratory (NRL) have devised a clever combination of materials — when
used during the thin - film growth process — to reveal that particle atomic layer
deposition, or p - ALD, deposits a uniform nanometer - thick shell on core particles regardless of core size, a discovery having significant impacts for many applications since most large scale powder production
techniques form powder batches that are made up of a range of particles sizes.
Now engineers at MIT [Massachusetts Institute of Technology], Oak Ridge National Laboratory, and King Fahd University of Petroleum and Minerals (KFUPM) have devised a process to repair these leaks, filling cracks and plugging holes
using a combination of chemical
deposition and polymerization
techniques.
«As a result, we were able to make long and narrow gaps
using atomic layer
deposition (ALD), which is a robust manufacturing
technique for coating ultra-thin films to construct insulating gaps in the sidewalls of patterned metals (see figure 1).
Lead author Jing Zhang, a postdoctoral researcher,
used an electron beam evaporation
technique in which to deposit electrodes to individual flakes that had been made via chemical vapor
deposition.
As my discomfort gave way to confidence, I developed
techniques I began to
use at every
deposition.