Sentences with phrase «use deposition techniques»

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Researchers used a combined atomic / molecular layer deposition (ALD / MLD) technique, to prepare lithium terephthalate, a recently found anode material for a lithium - ion battery.
Using a technique common in the semiconductor industry called atomic layer deposition (ALD), they coated pieces of silver with layers of aluminum oxide only 1 atom thick.
The researchers pulled off the feat by tuning the growth conditions of their films using a technique called metal organic chemical vapor deposition (MOCVD).
They used scalable dip - coating procedures to build up polymer multilayers and ensured thin metal electrode coatings with physical vapor deposition techniques.
Jonathan Petrie led the epitaxial synthesis of strained oxide materials and catalytic testing, and Tricia Meyer assisted thin film deposition using a technique that employs a high - power excimer laser to vaporize material and deposit it as high - quality thin films under precisely controlled conditions.
Atomic layer deposition is a layer - by - layer chemical vapor deposition - based thin - film growth technique used extensively in the electronics industry to deposit nanometer - thick films of dielectric materials on devices.
Abstract: Scientists at the U.S. Naval Research Laboratory (NRL) have devised a clever combination of materials — when used during the thin - film growth process — to reveal that particle atomic layer deposition, or p - ALD, deposits a uniform nanometer - thick shell on core particles regardless of core size, a discovery having significant impacts for many applications since most large scale powder production techniques form powder batches that are made up of a range of particles sizes.
Now engineers at MIT [Massachusetts Institute of Technology], Oak Ridge National Laboratory, and King Fahd University of Petroleum and Minerals (KFUPM) have devised a process to repair these leaks, filling cracks and plugging holes using a combination of chemical deposition and polymerization techniques.
«As a result, we were able to make long and narrow gaps using atomic layer deposition (ALD), which is a robust manufacturing technique for coating ultra-thin films to construct insulating gaps in the sidewalls of patterned metals (see figure 1).
Lead author Jing Zhang, a postdoctoral researcher, used an electron beam evaporation technique in which to deposit electrodes to individual flakes that had been made via chemical vapor deposition.
As my discomfort gave way to confidence, I developed techniques I began to use at every deposition.
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